APPLICATIONS OF TECHNOLOGY:
- Coatings and devices manufacturing using film materials
- Enhanced deposition rate
- Process control
Andre’ Anders of Berkeley Lab has developed a very high deposition rate magnetron sputtering wherein the surface of a target and the race track zone area of the target, in one embodiment, may be heated to such a degree of tilt the target material approaches the melting point and sublimation sets in. Controlled heating is achieved primarily through the monitoring of the temperature of the target material and with the aid of a processor subsequently controlling the target temperature by adjustment of the power being inputted to the target. This controlled heating to the sublimation point is effecting in high deposition rate metal coating of parts when used in conjunction with high power impulse magnetron sputtering deposition.
The apparatus includes a thermocouple, which is electronically connected to a microcomputer programmed to control the power of the pulse to the target, and the duty cycle of the power pulses to regulate the temperature of the system.
Manufacurers judge the viability of coatings technologies by both the quality of the coating as well as the processing cost. The rate of deposition determines the economics of the process.
STATUS: Published PCT Application WO/2010/120792 available at www.wipo.int. Available for licensing or collaborative research.
SEE THESE OTHER BERKELEY LAB TECHNOLOGIES IN THIS FIELD:
REFERENCE NUMBER: IB-2708