Please refer to the list of technologies below for licensing and research collaboration availability. If you can't find the technology you're interested in, please contact us at TTD@lbl.gov.
Ion Sources and Beam Technologies
- Antennae for Radio-Frequency (RF) Sources
- Cathodic Arc Plasma System
- Compact RF-Matching Network
- Constricted Plasma Source
- Detecting Nuclear Materials in Containers Using High-Energy Gamma Rays
- Extraction System for Ion Sources
- High Efficiency Spiral RF-Induction Antenna for Plasma Generators
- Lithography and Micromachining
- High Throughput Proximity Print System for Lithography, IB-1529, IB-1780
- Ion Beam Projection Lithography (IPL) for Minimizing Pattern Distortion and Mask Replacement/Repair, IB-1383
- Simplified and Compact Electron Cyclotron Resonance (ECR) Ion Source, IB-1562
- Ultra Low Energy Spread Ion Beam Source, IB-1165
- Universal Pattern Generator for Micro-Ion Beam Reduction Lithography, IB-1387, IB-1579
- Focused Ion Beam System
- Improved Plasma Immersion Ion Implantation
- Ion Beam Extractor with Counterbore
- Ion Source for Microprocessor Manufacturing
- Ion Texturing Methods and Articles
- Lithium-Drifted Silicon Detector with Segmented Contacts
- Low Power, High Energy Gamma Ray Detector Calibration Device
- Mini Pulsed Metal Plasma Source
- Particle Beam Biaxial Orientation of a Substrate for Epitaxial Crystal Growth
- Plasma-Driven Neutron/Gamma Generators
- Neutron and Proton Generators:
- Sub-5 Nanosecond Neutron Generator for Detection of Explosives
- Compact Systems for Effective and Precise Brachytherapy
- Cylindrical Neutron Generator with Nested Option, IB-1764
- Neutron-based System for Nondestructive Imaging, IB-1794
- Mini Neutron Tube, IB-1793a
- Ultra-short Ion and Neutron Pulse Production, IB-1707
- Mini Neutron Generator, IB-1793b
- Compact Spherical Neutron Generator, IB-1675
- Sub-5 Nanosecond Neutron Generator for Detection of Explosives
- Positive and Negative Ion Beam Merging System for Neutral Beam Production
- RF-Driven Plasma Source for Ion Implantation
- Selective Ion Source for Semiconductor Devices
- Shielded Capacitive Electrode
