The Center for X-Ray Optics Publications

(October 2007–September 2008)

W. Chao
Mesler, B.; Fischer, P.; Chao, W.; Anderson, E. H.; Kim, D.-Y., Soft X-ray Imaging of Spin Dynamics at
High Spatial and Temporal Resolution. Journal of Vacuum Science Technology B 2007, 25, 2598.
P. Fischer, D.-H. K., B.L. Mesler, W. Chao, A.E. Sakdinawat, E.H. Anderson, Exploring nanomagnetism
with soft X-ray microscopy. Surface Science 2007, 601, 4680.

E.M. Gullikson
Eriksson, F.; Ghafoor, N.; Schafers, F.; Gullikson, E. M.; Aouadi, S.; Rohde, S.; Hultman, L.; Birch, J.,
Atomic scale interface engineering by modulated ion-assisted deposition applied to soft x-ray
multilayer optics. Applied Optics 2008, 47, (23), 4196-4204.
Fernandez-Perea, M.; Larruquert, J. I.; Aznarez, J. A.; Mendez, J. A.; Vidal-Dasilva, M.; Gullikson, E.;
Aquila, A.; Soufli, R.; Fierro, J. L. G., Optical constants of electron-beam evaporated boron films
in the 6.8-900 eV photon energy range. Journal of the Optical Society of America a-Optics Image
Science and Vision 2007, 24, (12), 3800-3807.
Hardouin, A.; Delmotte, F.; Ravet, M. F.; Bridou, F.; Jerome, A.; Varniere, F.; Montcalm, C.; Hedacq, S.;
Gullikson, E.; Aubert, P., Experimental study of Cr/Sc multilayer mirrors for the nitrogen K-alphaemission
line. Journal of Vacuum Science & Technology A 2008, 26, (3), 333-337.
Heilmann, R. K.; Ahn, M.; Gullikson, E. M.; Schattenburg, M. L., Blazed high-efficiency x-ray diffraction via
transmission through arrays of nanometer-scale mirrors. Optics Express 2008, 16, (12), 8658-
8669.
Soufli, R.; Aquila, A. L.; Salmassi, F.; Fernandez-Perea, M.; Gullikson, E. M., Optical constants of
magnetron-sputtered boron carbide thin films from photoabsorption data in the range 30 to 770
eV. Applied Optics 2008, 47, (25), 4633-4639.

(October 2006–September 2007)

E. Anderson
B.-S. Kang, P. Fischer, D.-H. Kim, D. Attwood, E. Anderson, G. Cho, , "Bending Magnet X-Ray Polarization Modulation for Magnetic Full-Field Soft X-Ray Transmission Microscopy", IPAP Conference Series 7, 288 (2007).
P. Fischer, D.-H. Kim, B.-S. Kang, W. Chao, E. H. Anderson, "Achievements and Perspectives of Magnetic Soft X-Ray Transmission Microscopy", IPAP Conf. Series 7, 252 (2007).

E.M. Gullikson
P. P. Naulleau, F. Salmassi, E. M. Gullikson and J. A. Liddle, "Design and Fabrication of a High-Efficiency Extreme-Ultraviolet Binary Phase-Only Computer-Generated Hologram", Applied Optics 46 (14), 2581-2585 (2007).
S. P. Hau-Riege, H. N. Chapman, J. Krzywinski, R. Sobierajski, S. Bajt, R. A. London, M. Bergh, C. Caleman, R. Nietubyc, L. Juha, J. Kuba, E. Spiller, S. Baker, R. Bionta, K. S. Tinten, N. Stojanovic, B. Kjornrattanawanich, E. Gullikson, E. Plonjes, S. Toleikis and T. Tschentscher, "Subnanometer-Scale Measurements of the Interaction of Ultrafast Soft X-Ray Free-Electron-Laser Pulses with Matter", Physical Review Letters 98 (14), 145502 (2007).
A. L. Aquila, F. Salmassi, F. Dollar, Y. Liu and E. Gullikson, "Developments in Realistic Design for Aperiodic Mo/Si Multilayer Mirrors", Optics Express 14 (21), 10073-10078 (2006).

D.T. Attwood
M. G. Capeluto, P. Wachulak, M. C. Marconi, D. Patel, C. S. Menoni, J. J. Rocca, C. Iemmi, E. H. Anderson, W. Chao and D. T. Attwood, "Table Top Nanopatterning with Extreme Ultraviolet Laser Illumination", Microelectronic Engineering 84 (5-8), 721-724 (2007).
G. Vaschenko, A. G. Etxarri, C. S. Menoni, J. J. Rocca, O. Hemberg, S. Bloom, W. Chao, E. H. Anderson, D. T. Attwood, Y. Lu and B. Parkinson, "Nanometer-Scale Ablation with a Table-Top Soft X-Ray Laser", Optics Letters 31 (24), 3615-3617 (2006).
Y. Liu, Y. Wang, M. A. Larotonda, B. M. Luther, J. J. Rocca and D. T. Attwood, "Spatial Coherence Measurements of a 13.2 Nm Transient Nickel-Like Cadmium Soft X-Ray Laser Pumped at Grazing Incidence", Optics Express 14 (26), 12872-12879 (2006).

W. Chao
P. Fischer, D. H. Kim, B. L. Mesler, W. Chao and E. H. Anderson, "Magnetic Soft X-Ray Microscopy: Imaging Spin Dynamics at the Nanoscale", Journal of Magnetism and Magnetic Materials 310 (2), 2689-2692 (2007).

P. Fischer
P. Fischer, "Towards a Deeper Insight into Strongly Correlated Electron Systems – the Symbiosis between Experiment and Theory ", Journal of Physics: Condensed Matter 19 (18), 181002 (2007).
P. Fischer, D. H. Kim, B. L. Mesler, W. Chao and E. H. Anderson, "Magnetic Soft X-Ray Microscopy: Imaging Spin Dynamics at the Nanoscale", Journal of Magnetism and Magnetic Materials 310 (2), 2689-2692 (2007).
I. L. Guhr, S. van Dijken, G. Malinowski, P. Fischer, F. Springer, O. Hellwig and M. Albrecht, "Magnetization Reversal in Exchange Biased Nanocap Arrays", Journal of Physics D-Applied Physics 40 (10), 3005-3010 (2007).
L. J. Heyderman, S. Czekaj, F. Nolting, D. H. Kim and P. Fischer, "Cobalt Antidot Arrays on Membranes: Fabrication and Investigation with Transmission X-Ray Microscopy", Journal of Magnetism and Magnetic Materials 316 (2), 99-102 (2007).
G. Meier, M. Bolte, R. Eiselt, B. Kruger, D. H. Kim and P. Fischer, "Direct Imaging of Stochastic Domain-Wall Motion Driven by Nanosecond Current Pulses", Physical Review Letters 98 (18), 187202 (2007).
M. S. Pierce, C. R. Buechler, L. B. Sorensen, S. D. Kevan, E. A. Jagla, J. M. Deutsch, T. Mai, O. Narayan, J. E. Davies, K. Liu, G. T. Zimanyi, H. G. Katzgraber, O. Hellwig, E. E. Fullerton, P. Fischer and J. B. Kortright, "Disorder-Induced Magnetic Memory: Experiments and Theories", Physical Review B 75 (14), 144406 (2007).

Non-DOE

K. Goldberg
Sematech  - UV Mask Blank Inspection
A. Barty, P. Kearney, S. B. Rekawa, B. LaFontaine, O. Wood II, J. S. Taylor and H.-S. Han, "Multilayer Defects Nucleated by Substrate Pits: A Comparison of Actinic Inspection and Non-Actinic Inspection Techniques", SPIE 6349, 63492M (2006) 6349.
K. A. Goldberg, A. Barty, Y. W. Liu, P. Kearney, Y. Tezuka, T. Terasawa, J. S. Taylor, H. S. Han and O. R. Wood, "Actinic Inspection of Extreme Ultraviolet Programed Multilayer Defects and Cross-Comparison Measurements", Journal of Vacuum Science & Technology B 24 (6), 2824-2828 (2006).
H. Han, A. Barty, E. M. Gullikson, Y. Ikuta, T. Uno, O. R. Wood II, and S. Wurm, "Euv Met Printing and Actinic Imaging Analysis on the Effects of Phase Defects on Wafer Cds", Proc. SPIE 6517, 65170B-65171-65110 (2007).
K. A. Goldberg, H. Han., S. Wurm, P. Kearney, P. Seidel, O. R. Wood II, B. LaFontaine, T. Liang, C. Holfeld, R. Fettig, Y. Tezuka, T. Terasawa, "Comparison of Actinic and Non-Actinic Inspection of Programmed Defect Masks", EUVL Symposium 2006 October 18, 2006 abstract (2006).
K. A. Goldberg, P. Seidel, K. Edinger, R. Fettig, P. Kearney, H. Han, O. R. Wood II, "Euv and Non-Euv Inspection of Reticle Defect Repair Sites", Proc. SPIE 6517, 65170C-65171-65177 (2007).
K. A. Goldberg, P. Seidel, K. Edinger, R. Fettig, P. Kearney, H. Han, O. R. Wood II, "Euv and Non-Euv Inspection of Reticle Defect Repair Sites", Proc. SPIE 6517, 65170C-65171-65177 (2007).
K. A. Goldberg, A. Barty, S. B. Rekawa, C. D. Kemp, R. F. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, H.-S. Han, "Performance of Actinic Euvl Mask Imaging Using a Zoneplate Microscope", SPIE Photomask BACUS 6730 (2007).

E. Gullikson
Smithsonian Institution -  Reflectometry for AIA Multilayer Coatings
R. Soufli, S. L. Baker, D. L. Windt, E. M. Gullikson, J. C. Robinson, W. A. Podgorski and L. Golub, "Atomic Force Microscopy Characterization of Zerodur Mirror Substrates for the Extreme Ultraviolet Telescopes Aboard Nasa's Solar Dynamics Observatory", Applied Optics 46 (16), 3156-3163 (2007).

K. Goldberg
Sematech – LBNL Microexposure Tool Imaging for EUV Resists and Mask Research
K. Goldberg, "Testing Euv Optics with Euv Light: If You Can Measure It, You Can Make It", SPIE Newsroom: Optical Design & Engineering  (2006).
P. P. Naulleau, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. LaFontaine, and T. Wallow, "Recent Results from the Berkeley 0.3-Na Euv Microfield Exposure Tool", Proc. SPIE 6517, 65170V-65171-65178 (2007).

P. Naulleau
Sematech – LBNL Microexposure Tool Imaging for EUV Resists and Mask Research
P. Naulleau and J. Cain, "Experimental and Model-Based Study of the Robustness of Line-Edge Roughness Metric Extraction in the Presence of Noise", J. Vac. Sci. & Technol. B  25, 1647-1657.
P. Naulleau and J. Cain, "Experimental and Model-Based Study of the Robustness of Line-Edge Roughness Metric Extraction in the Presence of Noise", Virtual Journal of Nanoscale Science & Technology 16 (13) (2007).
P. Naulleau, B. La Fontaine, R. Kim, R. Sandberg, and T. Wallow, "Characterization of Advanced Euv Resists at the Berkeley Met Facility", Proceedings of SEMICON Korea 2007, STS Volume 1, 27-29 STS Volume 1, 27-29 (2007).
P. Naulleau, B. La Fontaine, R. Kim, R. Sandberg, and T. Wallow, "Sematech Berkeley Met Tool Enables Important Advanced in Euv Resists", SPIE Newsroom 10.1117/2.1 (2007).
P. Naulleau, B. La Fontaine, R. Kim, T. Wallow, "Lithographic Metrics for the Determination of Intrinsic Resolution Limits in Euv Resists", Proc SPIE 6517, 65172N (2007).
P. Naulleau, E. Gullikson, E. Anderson, "Holographic Optical Elements for the Extreme-Ultraviolet Regime", Proc SPIE  6462, 64620S-64621-64626 (2007).
P. P. Naulleau, K. Dean, P. Denham, K. A. Goldberg, B. Hoef, B. LaFontaine, and T. Wallow, "Recent Results from the Berkeley 0.3-Na Euv Microfield Exposure Tool", Proc. SPIE 6517, 65170V-65171-65178 (2007).
P. Naulleau, F. Salmassi, E. M. Gullikson and J. A. Liddle, "Design and Fabrication of a High-Efficiency Extreme-Ultraviolet Binary Phase-Only Computer-Generated Hologram", Applied Optics 46 (14), 2581-2585 (2007).
T. Wallow, B. La Fontaine, P. Naulleau, C. Anderson, R. Sandberg, "Progress in Euv Photoresist Technology", Proc SPIE 6533, 653317 6533, 653317.
T. Wallow, B. La Fontaine, P. Naulleau, C. Anderson, R. Sandberg and C. A. P. Naulleau, S. Horne, "Extreme Ultraviolet Interference Lithography with Incoherent Light", Proc SPIE 6517, 65172T (2007).

E. Anderson
UC Berkeley - Free-standing Zone Plates for Tabletop EUV Microscopes
M. G. Capeluto, P. Wachulak, M. C. Marconi, D. Patel, C. S. Menoni, J. J. Rocca, C. Iemmi, E. H. Anderson, W. Chao and D. T. Attwood, "Table Top Nanopatterning with Extreme Ultraviolet Laser Illumination", Microelectronic Engineering 84 (5-8), 721-724 (2007).
G. Vaschenko, A. G. Etxarri, C. S. Menoni, J. J. Rocca, O. Hemberg, S. Bloom, W. Chao, E. H. Anderson, D. T. Attwood, Y. Lu and B. Parkinson, "Nanometer-Scale Ablation with a Table-Top Soft X-Ray Laser", Optics Letters 31 (24), 3615-3617 (2006).
Molecular Imprints, Inc. - Development of SFIL template fabrication processes
G. M. Schmid, E. Thompson, N. Stacey, D. J. Resnick, D. L. Olynick and E. H. Anderson, "Template Fabrication for the 32 Nm Node and Beyond", Microelectronic Engineering 84 (5-8), 853-859 (2007).

W. Chao
Molecular Imprints, Inc. - Development of SFIL template fabrication processes
M. G. Capeluto, P. Wachulak, M. C. Marconi, D. Patel, C. S. Menoni, J. J. Rocca, C. Iemmi, E. H. Anderson, W. Chao and D. T. Attwood, "Table Top Nanopatterning with Extreme Ultraviolet Laser Illumination", Microelectronic Engineering 84 (5-8), 721-724 (2007).
G. Vaschenko, A. G. Etxarri, C. S. Menoni, J. J. Rocca, O. Hemberg, S. Bloom, W. Chao, E. H. Anderson, D. T. Attwood, Y. Lu and B. Parkinson, "Nanometer-Scale Ablation with a Table-Top Soft X-Ray Laser", Optics Letters 31 (24), 3615-3617 (2006).

E. Gullikson
Intel -  EUVL Mask Reflectometry, Defect Modeling and Thin Film Deposition
R. Soufli, R. M. Hudyma, E. Spiller, E. M. Gullikson, M. A. Schmidt, J. C. Robinson, S. L. Baker, C. C. Walton and J. S. Taylor, "Sub-Diffraction-Limited Multilayer Coatings for the 0.3 Numerical Aperture Micro-Exposure Tool for Extreme Ultraviolet Lithography", Applied Optics 46 (18), 3736-3746 (2007).