Weilun Chao

LBNL Staff Scientist

wlchao@lbl.gov
phone: 510-486-4447

Education
B.S. Physics, Electrical Engineering, Stony Brook University
Ph.D, Electrical Engineering and Computer Sciences,  University of California, Berkeley

Major Awards
2005 Werner Meyer-Ilse Memorial Award

General Research Interests
My research focuses on spatial resolution improvement and performance characterization of soft x-ray microscopy. I use electron beam lithography to make high quality, high resolution Fresnel zone plate lenses used by the soft x-ray microscopy. Together with Bruce Harteneck, currently at the Nanofabrication facility of the LBNL’s Molecular Foundry, we have developed an overlay lithographic process in the CXRO’s Nanofabrication Laboratory that allows very high resolution zone plates to be fabricated. Zone plates of 15 nm zone width were successfully fabricated, resulting in an achievement of sub-15 nm resolution at the XM-1 microscope in the Advanced Light Source, and it is of my interest to extend the process to 10 nm zone widths and below, producing a sub-10 nm resolution.
I am also interested in the effects on imaging performance of the partial coherence of the source and the imaging system, aberrations, zone plate defects like zonal roughness, just to name a few. I study the effects through simulations and experiments, using various types of specially designed test objects.  

MSD Research Projects:
Center for X-Ray Optics

Personal website: http://www.cxro.msd.lbl.gov/~wlchao/index.php