To all MSD investigators:

The new SEM that was installed at NCEM last year has now met performance specs and is ready for use by all MSD investigators.

The machine is a JEOL model JSM6340F equipped with electron beam lithography capabilities. The combination of a cold cathode field emission source and a semi-in-lens objective lens design permits resolutions on the order of 1.2 nm to be achieved when operating at a voltage of 15 kV.
The microscope can operate at voltages from 0.5 kV to 2.9 kV in 10 V steps, and between 2.9 kV and 30 kV in 100 V steps, allowing images of a variety of insulating and semi-insulating materials without specimen coating. Additionally, the unit is equipped with a back-scattered electron detector that permits observation of atomic number contrast.

The lithography capabilities of the instrument are such that lines on the order of 30 nm can be obtained at voltages of 30 kV, with precise stage registry.
Because this microscope was purchased with MDI funds, a fraction of time is reserved for the owners' groups (Alivisatos, McEuen), if needed. To defray operating costs, a fee of $60 per hour will be charged to all users (including owners and NCEM users).

To sign up for usage and training, or to get help or advice, contact us at
x4324 Doreen Ah-Tye (technical)
x6036 Jane Cavlina (administrative)
x4634 Eric Stach (scientific)
We look forward to seeing you here,

Uli Dahmen,
Head, NCEM