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ABSTRACT:
Methods for growing patterned networks of large numbers
of neurons are important to our understanding of how the brain
works, as well as to the development of novel kinds of computer
architecture that may parallel the organization of the brain.
We have investigated the use of metal ion implantation using
a vacuum arc ion source, and plasma deposition with a filtered
vacuum arc system, as a means of forming regions of selective
neuronal attachment on surfaces.
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Lithographic masks created by treating surfaces with ion
species that enhance or inhibit neuronal cell attachment allow
subsequent proliferation and/or differentiation of the neurons
to form desired patterns. Plasma deposition of optically transparent,
electrically conducting, ultra-thin metal films can also be
used to form electrodes for extra-cellular electrical stimulation
of neurons. In the work described here used glass microscope
slides as substrates, and some of the experiments made use
of simple masks to form patterns of ion beam or plasma deposition
treated regions. PC-12 rat neurons were then cultured on the
treated substrates coated with Type I Collagen, and the growth
and differentiation was monitored. Particularly good results
were obtained, for example, for the case of plasma deposition
of carbon to form a diamond-like carbon film of thickness
about one hundred Angstroms. Neuron proliferation and the
elaboration of dendrites and axons after the addition of nerve
growth factor both showed excellent contrast, with prolific
growth and differentiation on the treated surfaces and very
low growth on the untreated surfaces.
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