E.O. Lawrence Berkeley National Laboratory
APPLICATIONS OF TECHNOLOGY:
- Ion source for particle accelerators
- Electron Beam Ion Source (EBIS) Injection
- Isotope separation
- Heavy ion fusion
- Material analysis
- Propulsion
- Neutron production
ADVANTAGES:
- Extremely compact
- Operation flexibility; can be clustered together
- Compatible with wide range of metals
- Precise control of plasma flux
ABSTRACT: Berkeley National Laboratory researchers Ian Brown, James Galvin, Robert Macgill, David Ogletree and Miquel Salmeron, have developed a highly compact ion source that operates in pulsed mode, works with a wide range of metals, is ultra-high vacuum compatible, and give precise control of plasma flux. It's small size gives it operational flexibility, and can be clustered. The mini-pulsed plasma source will find use in ion source applications including heavy ion fusion, particle accelerators, and Electron Beam Ion Source (EBIS). It also has application in isotope separation, neutron production, materials analysis and spacecraft propulsion.
STATUS: U.S. Patent #5,841,236. Available for licensing
REFERENCE NUMBER: IB-779C
